The objective of the PASMOMA project was to develop high-resolution patterning of multifunctional materials without the use of complex lithography methods and to scale the technique up for the fabrication of large-area multifunctional arrays for photonic and electronics applications. This project tackled a critical manufacturing need, which is currently holding back the use of Large-Area Electronics technologies in high-volume markets.
- to pattern surface relief/energy structures using non-lithographic processes
- to realise selectivity of particle deposition based on relief structure size
- to deposit different materials (dielectrics, conductors, semiconductors) at predefined positions
- to gain precise size control of particles in semiconductor microdispersion
- The project achieved controlled, patterned deposition of insulating, conducting and light-emitting nanoparticles from microemulsions onto patterned substrates over areas as large as 2 x 2 cm^2
- Establishment of Convective Self-Assembly (CSA) for “nano-pinballing” functional colloid dispersions (colloidal nanoparticles, NPs) onto surface-patterned substrates.
- Key results included:
- Different sizes of micro or nanoparticles can be deposited into grooves homogeneously and with an ordered structure.
- There is some potential for scaling up the process for larger area (e.g. by adjusting the amount of the colloidal suspension and the size of the blade), although the deposition process is currently slow.